People of the Methodology Center - Liying Huang, Ph.D.

Penn State Shield

The Methodology Center

Main Menu

Software Downloads

About the Center

User Login

Follow Us

Methodology Center Twitter Page

Methodology Center RSS Feeds

Methodology Center Facebook Page

People of the Methodology Center

Home People Liying Huang Ph.D.

Liying Huang, Ph.D.
Programmer Analyst, The Methodology Center


	The Methodology Center The Pennsylvania State University 204 E. Calder Way, Suite 400 State College, PA 16801

	This e-mail address is being protected from spambots. You need JavaScript enabled to view it
	814-865-4323
	814-863-0000

	Biosketch
	CV

Education:
	Ph.D., Michigan State University, 1995 (Applied Mathematics) M.S., Michigan State University, 1992 (Statistics) B.S., Peking University, 1989 (Mathematics and Information Science)
Current Projects and Collaborators:
	I work with John Dziak and Stephanie Lanza of The Methodology Center on the development of new SAS prodecures. Now we are working on the new releases of SAS procedures (LCA, LTA) developed from Fortran codes. In addition, I am interested in building web-based application using Ruby on Rails.
Publications:
	Peer-reviewed Papers
	Huang, L., & Yen, D. (1997). A Gauss-Galerkin finite-difference method for singular partial differential equations in two space variables. Numerical Methods for Partial Differential Equations, 13, 331-355.
	Other Publications
	Kozaczek, K., Martin, R., Huang, L., Kurtz, D., & Moran, P. (2003). Room temperature electroplated Copper recrystallization: In-situ mapping on 200/300 mm patterned wafers. AIP Conference Proceedings of the International Conference on Characterization and Metrology for ULSI Technology, 683, 485-489, DOI:10.1063/1.1622515. Kozaczek, K., Kurtz, D., Moran, P., Martin, R., Huang, L., & Stratilatov, A. (2003). Metrology tool for microstructure control on 300 mm wafers during damascene copper processing. AIP Conference Proceedings of the International Conference on Characterization and Metrology for ULSI Technology, 683, 490-493, DOI:10.1063/1.1622516. Kozaczek, K., Moran, P., Kurtz, D., Martin, R., Huang, L., & Stratilatov, A. (2003). D080 X-ray diffraction metrology tool for microstructure control on 300mm wafers for silicon based semiconductors, Powder Diffraction, 18, 172-172.